PubRank

W T Silfvast

Author PubWeight™ 0.75‹?›

Top papers

Rank Title Journal Year PubWeight™‹?›
1 Intense plasma discharge source at 13.5 nm for extreme-ultraviolet lithography. Opt Lett 1997 0.75
2 Investigation of distortion and damage of molybdenum†silicon multilayer reflective coatings with high-intensity ultraviolet radiation. Appl Opt 1993 0.75
3 Gain scaling of short-wavelength plasma-recombination lasers. Opt Lett 1983 0.75
4 Simple efficient travelin-wave excitation of short-wavelength lasers using a conical pumping geometry. Opt Lett 1989 0.75
5 Recombination lasers in Nd and CO(2) laser-produced cadmium plasmas. Opt Lett 1979 0.75
6 Recombination laser transitions in expanding plasmas of Mg, Ca, Cu, Zn, Ag, Cd, In, Sn, Pb, and Bi. Opt Lett 1982 0.75
7 High-Temperature Lithium Metal-Vapor Capillary Discharge Extreme-Ultraviolet Source at 13.5 nm. Appl Opt 2000 0.75
8 Production of spectrally narrow soft-x-ray radiation through the use of broadband laser-produced plasma sources and multilayer-coated reflecting optics. Appl Opt 1995 0.75
9 Velocity characterization of particulate debris from laser-produced plasmas used for extreme-ultraviolet lithography. Appl Opt 1995 0.75
10 Stimulated emission in the ultraviolet by optical pumping from photoionization-produced inner-shell states in Cd(+). Opt Lett 1985 0.75
11 Intense xenon capillary discharge extreme-ultraviolet source in the 10-16-nm-wavelength region. Opt Lett 1998 0.75
12 Introduction to special issue of Applied Optics on soft-x-ray projection lithography. Appl Opt 1993 0.75
13 Population inversions in C IV in a recombing theta-pinch plasma. Opt Lett 1987 0.75
14 Comparison of extreme-ultraviolet flux from 1.06- and 10.6-Mum laser-produced plasma sources for pumping photoionization lasers. Opt Lett 1986 0.75
15 Intramolecular hydrogen bonding of azo dyes in aqueous solution. Proc Natl Acad Sci U S A 1968 0.75
16 Soft-x-ray projection imaging with a 1:1 ring-field optic. Appl Opt 1993 0.75
17 A Simple High Temperature System for cw Metal Vapor Lasers. Appl Opt 1970 0.75
18 Soft-x-ray projection lithography: printing of 0.2-microm features using a 20:1 reduction. Opt Lett 1990 0.75
19 Xenon capillary discharge extreme-ultraviolet source emitting over a large angular range. Appl Opt 2001 0.75
20 Characterization and control of laser plasma flux parameters for soft-x-ray projection lithography. Appl Opt 1993 0.75